Metal Alloy High Purity Titanium Sputtering Target

Titanium Sputtering targets are used frequently in flat display coatings, hardware tool coating, decorative coat, semiconductor components and for semiconductor components. This is also an important material for the preparation of integrated circuits.

High Purity Titanium Suttering Target for Metal Alloy:
Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering targets are made from titanium metal. This is a strong and lightweight material that is well-respected for its strength-to-weight ratio. Titanium metal, a heavy metal that has low density is very ductile. This is especially true in an oxygen-free atmosphere. Because it has a high melting temperature (more than 1,650 degrees Celsius or 3,000 degrees Fahrenheit), this metal is useful for refractory purposes. Paramagnetic with low electrical and thermal conductivity, it is also paramagnetic.

Application:
This is mainly for flat panel application, flat panels display and integrated circuits.

Transport and Payment

Steel Alloy High Purity Ti Titanium Sputtering Target Property

Other Titles The Titanium sputtering goal
N/A
Compound Formula Ti
Molecular Weight N/A
Appearance N/A
Melting Point N/A
Solubility In Water N/A
Density N/A
Purity 99.6%
Size Individualized
Bold Point N/A
Specific Heat N/A
Thermo Conductivity N/A
Thermal Expansion N/A
Young's Module N/A
Exact mass N/A
Monoisotopic N/A

Steel Alloy Titanium Sputtering High Purity Target Health & Safety Information

Safety Notice N/A
Hazard Statements N/A
Flashing Point N/A
Hazard Codes N/A
Risk Codes N/A
Safety statements N/A
RTECS # N/A
Transport Information N/A
Germany N/A

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